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Microsense sf6 n2 Treatment in Micronesia

Microsense sf6 n2 Treatment in Micronesia

Blue-M box furnace with N2 purge; ProTemp wet/dry oxidation with DCE; Allwin 610 RTP/RTA with O2, N2, Ar, H2 forming gas, 200-1250C; ETCH RIE and DRIE. STS Aspect ICP DRIE: time-multiplex Si etch (anti-footing) Oxford Plasmalab 100+ ICP time-multiplex cryo DRIE SF6, CF4, CHF3, O2, Ar, Cl2, HBr, N2; Oxford Plasmalab 80+ multipurpose (SF6, CF4, O2, Ar)

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